Emdpa
Structure de mise en forme 2 colonnes
  • Sunday 05 September 2010

  • EMDPA will provide research laboratories and industry with a unique "multi-dimensional" analysis tool of all types of layered materials, allowing direct, simultaneous elemental and molecular quantitative measurements with a sensitivity down to 100 ppb in the depth profiling mode for all elements of the Periodic Table, in observed zones of millimetre dimensions, through the development of a Micro Modulated or Pulsed Radio Frequency Glow Discharge Time of Flight Mass Spectrometer.

    Such instrument represents a major breakthrough as it will change the way surface and depth profiling analysis is regarded, being ultra fast, easy to use and low cost.

    The instrument is dedicated to the depth profiling of advanced materials made of conductive and/or non-conductive thin layers down to the nanometre scale.

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    The development of such a radically new analytical instrument requires the understanding of key-phenomena:

    • Understanding/modelling of the sputtering mechanisms and ionization processes
    • Characterization of sputtered surfaces and understanding/modelling molecular chemistry in plasmas
    • Ion transport phenomena and detection methods
    • Assessment of performance properties

    The European critical mass proposed is a cross multidisciplinary consortium gathering 10 multi-disciplinary organizations coming from 5 different member states (France, Germany, Italy, UK, Spain), with 1 associated country (Switzerland) and 1 candidate country (Romania).

    The partnership embraces experts in plasma physics/chemistry and plasma-surface interactions (LAPLACE (CPAT), NILPRP, UNICT), renowned groups in GD-MS design, chemometrics and data handling (ISAS, UNIOVI, EMPA), a recognised research centre with expertise in all aspects of material sciences (UoM), a provider of innovative TOFMS technologies (TW) and a large company manufacturing GD optical spectrometry instruments (HJY).